Langmuir probe and optical emission spectroscopy studies for RF magnetron sputtering during TiON thin film deposition

dc.contributor.author	Metawa, A. E.
dc.contributor.author	El-Hossary, F. M.
dc.contributor.author	Raaif, M.
dc.contributor.author	Salaheldeen, Mohamed Hassan
dc.contributor.author	El-Moula, A. A. A.
dc.date.accessioned	2021-06-01T09:42:31Z
dc.date.available	2021-06-01T09:42:31Z
dc.date.issued	2020
dc.identifier.citation	Chinese Journal of Physics, 68, p. 168-177 (2020); doi:10.1016/j.cjph.2020.09.012
dc.identifier.issn	0577-9073
dc.identifier.uri	http://hdl.handle.net/10651/58771
dc.format.extent	p. 168-177
dc.language.iso	eng
dc.relation.ispartof	Chinese Journal of Physics
dc.rights	© 2020 The Physical Society of the Republic of China (Taiwan). Published by Elsevier B.V
dc.source	Scopus
dc.source.uri	https://www.scopus.com/inward/record.uri?eid=2-s2.0-85091255791&doi=10.1016%2fj.cjph.2020.09.012&partnerID=40&md5=1b75e123b502a03fb112360a21ec1651
dc.title	Langmuir probe and optical emission spectroscopy studies for RF magnetron sputtering during TiON thin film deposition
dc.type	journal article
dc.identifier.doi	10.1016/j.cjph.2020.09.012
dc.relation.publisherversion	http://dx.doi.org/10.1016/j.cjph.2020.09.012

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